Low-Temperature Surface Passivation of Moderately Doped Crystalline Silicon by Atomic-Layer-Deposited Hafnium Oxide Films
Author:
Publisher
The Electrochemical Society
Subject
Electronic, Optical and Magnetic Materials
Reference30 articles.
1. 22.8% efficient silicon solar cell
2. Low‐Temperature Surface Passivation of Silicon for Solar Cells
3. Overview on SiN surface passivation of crystalline silicon solar cells
4. Surface passivation of p-type crystalline Si by plasma enhanced chemical vapor deposited amorphous SiCx:H films
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