Author:
Simoen E.,Ritzenthaler R.,Cho M.-J.,Schram T.,Horiguchi N.,Aoulaiche M.,Spessot A.,Fazan P.,Claeys C.
Publisher
The Electrochemical Society
Subject
Electronic, Optical and Magnetic Materials
Reference21 articles.
1. Band offsets and work function control in field effect transistors
2. Anomalous VFB Shift in High-k Gate Stacks - Is its Origin at the Top or Bottom Interface ? -
3. Ritzenthaler R. Schram T. Spessot A. Caillat C. Cho M. Simoen E. Aoulaiche M. Albert J. Chew S. A. Noh K. B. Son Y. Fazan P. Horiguchi N. Thean A. , in IEDM Tech. Dig., The IEEE (New York), p. 772 (2014).
4. Kamimuta Y. Iwamoto K. Nunoshige Y. Hirano A. Mizubayashi W. Watanabe Y. Migita S. Ogawa A. Ota H. Nabatame T. Toriumi A. , in IEDM Tech. Dig., The IEEE (New York), p. 341 (2007).
5. Effects of $\hbox{Al}_{2}\hbox{O}_{3}$ Dielectric Cap and Nitridation on Device Performance, Scalability, and Reliability for Advanced High- $\kappa$/Metal Gate pMOSFET Applications
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