Optical and Electrical Properties of Ti<SUB>x</SUB>Si<SUB>1-x</SUB>O<SUB>y</SUB> Films
Author:
Publisher
Wiley
Subject
Electrical and Electronic Engineering,General Computer Science,Electronic, Optical and Magnetic Materials
Reference17 articles.
1. Hybrid titanium–aluminum oxide layer as alternative high-k gate dielectric for the next generation of complementary metal–oxide–semiconductor devices
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1. Tunable optical and electrical properties of thermal and plasma-enhanced atomic layer deposited Si-rich SixTi1−xO2 thin films;Journal of Applied Physics;2021-02-07
2. Titanium dioxide thin films by atomic layer deposition: a review;Semiconductor Science and Technology;2017-08-23
3. Sol-gel synthesis of xTiO2(100 −x)SiO2 nanocomposite thin films: Structure, optical and antireflection properties;Thin Solid Films;2014-08
4. Crystallinity of inorganic films grown by atomic layer deposition: Overview and general trends;Journal of Applied Physics;2013-01-14
5. Plasma-Assisted Atomic Layer Deposition: Basics, Opportunities, and Challenges;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2011-09
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