Evaluation of local CD and placement distribution on EUV mask and its impact on wafer
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SPIE
Reference5 articles.
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3. Quantification of area-selective deposition on nanometer-scale patterns using Rutherford backscattering spectrometry;Scientific Reports;2022-10-22
4. Impact of mask variations on CD and placement in resist: local versus global effects;Optical and EUV Nanolithography XXXV;2022-05-26
5. Statistical analysis of the impact of 2D reticle variability on wafer variability in advanced EUV nodes using large-scale Monte Carlo simulations;Extreme Ultraviolet (EUV) Lithography XII;2021-02-26
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