Author:
Farrell Richard A.,Hosler Erik R.,Schmid Gerard M.,Xu Ji,Preil Moshe E.,Rastogi Vinayak,Mohanty Nihar,Kumar Kaushik,Cicoria Michael J.,Hetzer David R.,DeVilliers Anton
Reference16 articles.
1. Simple and Versatile Methods To Integrate Directed Self-Assembly with Optical Lithography Using a Polarity-Switched Photoresist
2. Borodovsky, Y., “Complementary Lithography at Insertion and Beyond,” Semicon West, San Francisco, CA, USA (2012).
3. A comparison of the pattern transfer of line-space patterns from graphoepitaxial and chemoepitaxial block co-polymer directed self-assembly;Millward,2014
4. Fabrication of 28nm pitch Si fins with DSA lithography;Schmid,2013
5. Defect source analysis of directed self-assembly process
Cited by
11 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献