Fast and accurate scatterometry metrology method for STI CMP step height process evaluation-Reference-Cited by-同舟云学术

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Fast and accurate scatterometry metrology method for STI CMP step height process evaluation

Published:2012-03-29 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Lin Chih-Hsun,Huang Climbing,Hsu Chia-Lin,Sie Wu-Sian,Wu J. Y.,Lin Ching-Hung B.,Xu Zhi-Qing J.,Yuan Qiong-Yan,Yoo Sungchul,Huang Chien-Jen E.,Cheng Chao-Yu H.,Cheng Juli,Jiang Zhiming,Chouaib Houssam

Publisher

SPIE

Cited by 9 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Scatterometry Critical Dimension Solution for Gate All Around Sheet-Specific Metrology: Topic/category: Advanced Metrology;2024 35th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC);2024-05-13

2. Optical in die NZO benefit for DRAM manufacturing;Metrology, Inspection, and Process Control XXXVIII;2024-04-10

3. Leveraging x-ray scatterometry and machine learning to enable robust and high-throughput optical critical dimension metrology for advanced 3D flash memory contact hole profile;Metrology, Inspection, and Process Control XXXVIII;2024-04-10

4. Enable in-die overlay measurement on DRAM storage node by line scan self-calibration method;Metrology, Inspection, and Process Control XXXVIII;2024-04-10

5. Mueller matrix spectroscopy and physics-based machine learning for gate-all-around sheet-specific metrology;Metrology, Inspection, and Process Control XXXVII;2023-04-27

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