Leveraging x-ray scatterometry and machine learning to enable robust and high-throughput optical critical dimension metrology for advanced 3D flash memory contact hole profile-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Leveraging x-ray scatterometry and machine learning to enable robust and high-throughput optical critical dimension metrology for advanced 3D flash memory contact hole profile

Published:2024-04-10 Issue: Volume:3 Page:125
ISSN:
Container-title:Metrology, Inspection, and Process Control XXXVIII
language:
Short-container-title:

Author:

Chouaib Houssam,Shi Teng,Chou Anderson,Kawanami Shinya,Takahara Masatomo,Luo Yeunchian,Leiyin Zhijie,Zeng Bin,Shaughnessy Derrick,Tan Zhengquan,Sasaki Kaori,Momotori Naoki

Publisher

SPIE

Reference16 articles.

1. A new ruler on the storage market: 3D flash memory for high density memory and its technology evolutions and challenges on the future;Lee;2016 IEEE International Electron Devices Meeting (IEDM),2016

2. IEEE Transactions on Electron Devices

3. Metrology challenges in 3D flash memory technical development and manufacturing;Zhang;J. Microelectron. Manuf,2019

4. Metrology and Inspection: Challenges and Solutions for Emerging Technology Nodes;Srivatsa,2020

5. Measuring thin films on grating and bandgap on grating;Chouaib;US Patent 11,555,689,2023

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP