Mueller matrix spectroscopy and physics-based machine learning for gate-all-around sheet-specific metrology-Reference-Cited by-同舟云学术

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Mueller matrix spectroscopy and physics-based machine learning for gate-all-around sheet-specific metrology

Published:2023-04-27 Issue: Volume: Page:
ISSN:
Container-title:Metrology, Inspection, and Process Control XXXVII
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Author:

Chouaib Houssam,Chou Anderson,Dimastrodonato Valeria,Lin Kai-Hsiang,Hsieh Ben,Chang Hao-miao,Chuang James,Hsiao Brooks,Pandev Stilian,Tan Zhengquan,Shaughnessy Derrick

Publisher

SPIE

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Spectroscopic ellipsometry to characterize the Transition-Metal dichalcogenides single crystals doping concentration;Optics & Laser Technology;2024-07

2. Advancements in metrology for advanced semiconductor packaging;Optics and Photonics for Advanced Dimensional Metrology III;2024-06-18

3. Scatterometry Critical Dimension Solution for Gate All Around Sheet-Specific Metrology: Topic/category: Advanced Metrology;2024 35th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC);2024-05-13

4. Optical in die NZO benefit for DRAM manufacturing;Metrology, Inspection, and Process Control XXXVIII;2024-04-10

5. Novel ellipsometry metrology-based machine learning technique for low sensitivity characterization of critical dimensions within gate-all-around transistors;Metrology, Inspection, and Process Control XXXVIII;2024-04-10

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