Exact and reliable overlay metrology in nanoscale semiconductor devices using an image processing method-Reference-Cited by-同舟云学术

Exact and reliable overlay metrology in nanoscale semiconductor devices using an image processing method

Published:2014-10-10 Issue:4 Volume:13 Page:041409
ISSN:1932-5150
Container-title:Journal of Micro/Nanolithography, MEMS, and MOEMS
language:en
Short-container-title:J. Micro/Nanolith. MEMS MOEMS

Author:

Park Jinkook¹,Shin ChaeHo¹,Kim Minkook¹,Kim Junghwan¹,Park JeongKyun¹,Kim JungSoo¹,Jun ChungSam¹,Yim Yeny²,Lee Janghee²

Affiliation:

1. Samsung Electronics, Memory Division, San #16 Banwol-Dong, Hwasung-City, Gyeonggi-do 445-701, Republic of Korea

2. Samsung Electronics, Manufacturing Technology Center, Samsung-Ro #129, Yeongtong-gu, Suwon-City, Gyeonggi-do 443-742, Republic of Korea

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference21 articles.

1. High order correction and sampling strategy for 45nm immersion lithography overlay control

2. Improved overlay control through automated high-order compensation

3. Overlay Error Compensation Using Advanced Process Control With Dynamically Adjusted Proportional-Integral R2R Controller

4. Run-to-Run Overlay Control of Steppers in Semiconductor Manufacturing Systems Based on History Data Analysis and Neural Network Modeling

5. A semiconductor photolithography overlay analysis system using image processing approach;Lin,2007

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