High order correction and sampling strategy for 45nm immersion lithography overlay control
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SPIE
Cited by 8 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. An Augmented Regression Model for Tensors With Missing Values;IEEE Transactions on Automation Science and Engineering;2021
2. Hybrid Overlay Modeling for Field-by-Field Error Correction in the Photolithography Process;IEEE Transactions on Semiconductor Manufacturing;2020-02
3. Gate patterning strategies to reduce the gate shifting phenomenon for 14 nm fully depleted silicon-on-insulator technology;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2016-12-20
4. Overlay improvement in nanoimprint lithography for 1×-nm patterning;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2016-11
5. Lithography overlay control improvement using patterned wafer geometry for sub-22nm technology nodes;SPIE Proceedings;2015-03-19
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