Run-to-Run Overlay Control of Steppers in Semiconductor Manufacturing Systems Based on History Data Analysis and Neural Network Modeling-Reference-Cited by-同舟云学术

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Run-to-Run Overlay Control of Steppers in Semiconductor Manufacturing Systems Based on History Data Analysis and Neural Network Modeling

Published:2005-11 Issue:4 Volume:18 Page:605-613
ISSN:0894-6507
Container-title:IEEE Transactions on Semiconductor Manufacturing
language:en
Short-container-title:IEEE Trans. Semicond. Manufact.

Author:

Park S.-J.,Lee M.-S.,Shin S.-Y.,Cho K.-H.,Lim J.-T.,Cho B.-S.,Jei Y.-H.,Kim M.-K.,Park C.-H.

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Subject

Electrical and Electronic Engineering,Industrial and Manufacturing Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

http://xplorestaging.ieee.org/ielx5/66/32644/01528575.pdf?arnumber=1528575

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