Hybrid metrology: from the lab into the fab-Reference-Cited by-同舟云学术

Hybrid metrology: from the lab into the fab

Published:2014-11-06 Issue:4 Volume:13 Page:041410
ISSN:1932-5150
Container-title:Journal of Micro/Nanolithography, MEMS, and MOEMS
language:en
Short-container-title:J. Micro/Nanolith. MEMS MOEMS

Author:

Vaid Alok¹,Elia Alexander¹,Iddawela Givantha¹,Bozdog Cornel²,Sendelbach Matthew²,Kang Byung Cheol (Charles)²,Isbester Paul K.²,Wolfling Shay²

Affiliation:

1. GlobalFoundries, 400 Stonebreak Road Extension, Malta, New York 12020, United States

2. Nova Measuring Instruments, Ltd., P.O. Box 266, Weizmann Science Park, Rehovot 76100, Israel

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference9 articles.

1. A holistic metrology approach: hybrid metrology utilizing scatterometry, CD-AFM, and CD-SEM

2. Improving optical measurement accuracy using multi-technique nested uncertainties

3. Hybrid reference metrology exploiting patterning simulation

4. 3D-AFM enhancement for CD metrology dedicated to lithography sub-28-nm node requirements

5. Simultaneous measurement of optical properties and geometry of resist using multiple scatterometry targets

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