Author:
Ober Christopher,Jiang Jing,Zhang Ben,Li Li,Giannelis Emmanuel,Chun Jun Sung,Neisser Mark,Sierra-Alvares Reyes
Reference8 articles.
1. Nanoparticle photoresists from HfO2 and ZrO2 for EUV patterning
2. Development of an Inorganic Nanoparticle Photoresist for EUV, E- beam and 193 nm Lithography;Krysak,2012
3. Nanoparticle Photoresists: Ligand Exchange as a New, Sensitive EUV Patterning Mechanism
4. Increasing sensitivity of oxide nanoparticle photoresists;Chakrabarty,2014
5. Oxide nanoparticle EUV resists: toward understanding the mechanism of positive and negative tone patterning;Chakrabarty,2013
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