Nanoparticle Photoresists: Ligand Exchange as a New, Sensitive EUV Patterning Mechanism-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Nanoparticle Photoresists: Ligand Exchange as a New, Sensitive EUV Patterning Mechanism

Published:2013 Issue:5 Volume:26 Page:659-664
ISSN:0914-9244
Container-title:Journal of Photopolymer Science and Technology
language:en
Short-container-title:J. Photopol. Sci. Technol.

Author:

Kryask Marie,Trikeriotis Markos,Ouyang Christine,Chakrabarty Sovik,Giannelis Emmanuel P.,Ober Christopher K.

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

https://www.jstage.jst.go.jp/article/photopolymer/26/5/26_659/_pdf

Reference5 articles.

1. 1. Levinson, H. J., Extreme ultraviolet lithography's path to manufacturing. J. Micro/Nanolith. MEMS MOEMS, 8(4) (2009), 1-9.

2. 2. Krysak, M.; Trikeriotis, M.; Schwartz, E.; Lafferty, N.; Xie, P.; Smith, B.; Zimmerman, P.; Montgomery, W.; Giannelis, E.; Ober, C. K., “Development of an inorganic nanoparticle photoresist for EUV, e-beam, and 193 nm lithography”. Proc. SPIE (Pt. 1, Advances in Resist Materials and Processing Technology XXVIII) 7972 (2011), 79721C1-C6.

3. 3. Trikeriotis, M.; Bae, W. J.; Schwartz, E.; Krysak, Ober, C. K.; Giannelis, E. P., “Development of an inorganic photoresist for DUV, EUV, and electron beam imaging”. Proc. SPIE (Pt. 1, M.; Lafferty, N.; Xie, P.; Smith, B.; Zimmerman, P.;Advances in Resist Materials and Processing Technology XXVII) 7639 (2010), 76390E1-E10.

4. 4. Trikeriotis, M.; Krysak, M.; Chung, Y. S.; Ouyang, C.; Cardineau, B.; Brainard, R.; Ober, C. K.; Giannelis, E. P.; Cho, K. Y., A new inorganic EUV resist with high-etch resistance. Proc. of SPIE 2012, 8322, 83220U1-U6.

5. 5. Gokan, H.; Esho, S.; Ohnishi, Y., Dry Etch Resistance of Organic Materials. J. Electrochem. Soc. 130 (1983), 143-146.

Cited by 38 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Advanced lithography materials: From fundamentals to applications;Advances in Colloid and Interface Science;2024-07

2. Design strategy of extreme ultraviolet resists;Japanese Journal of Applied Physics;2024-05-01

3. Study on resist performance of inorganic-organic resist materials for EUV and EB lithography;Advances in Patterning Materials and Processes XLI;2024-04-09

4. A study on the resist performance of inorganic-organic resist materials for EUV and electron-beam lithography;Japanese Journal of Applied Physics;2024-04-01

5. Charge Shielding-Oriented Design of Zinc-Based Nanoparticle Liquids for Controlled Nanofabrication;Journal of the American Chemical Society;2023-10-19

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3