Radiation-induced carbon contamination of optics-Reference-Cited by-同舟云学术

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Radiation-induced carbon contamination of optics

Published:2002-07-05 Issue: Volume: Page:
ISSN:0277-786X
Container-title:Emerging Lithographic Technologies VI
language:
Short-container-title:

Author:

Kurt Ralph,van Beek Michiel,Crombeen Co,Zalm Peer,Tamminga Yde

Publisher

SPIE

Cited by 25 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Leveraging sub-E0 dose assessment methodology to improve EUV lithography cluster dose performance;Extreme Ultraviolet (EUV) Lithography XI;2020-03-23

2. Removal of EUV exposed hydrocarbon from Ru capping layer of EUV mask using the mixture of alkaline solutions and organic solvents;Colloids and Surfaces A: Physicochemical and Engineering Aspects;2018-10

3. Impact of Plasmon-Induced Atoms Migration in Harmonic Generation;ACS Photonics;2018-02-08

4. Quick AS NEXAFS Tool(QANT): a program for NEXAFS loading and analysis developed at the Australian Synchrotron;Journal of Synchrotron Radiation;2016-01-01

5. Growth of nano-dots on the grazing-incidence mirror surface under FEL irradiation;Journal of Synchrotron Radiation;2016-01-01

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