Author:
Kim Min-Su,Purushothaman Muthukrishnan,Kim Hyun-Tae,Song Hee-Jin,Kim Young-Woong,Ahn Jin-Ho,Oh Hye-Keun,Park Jin-Goo
Funder
Future Semiconductor Device Technology Development Program
MOTIE
KSRC
Subject
Colloid and Surface Chemistry
Reference37 articles.
1. Improved reflectance and stability of Mo/Si multilayers;Bajt;Proc. SPIE,2001
2. Handbook of Photomask Manufacturing Technology;Yan,2005
3. Extreme ultraviolet lithography: a review;Wu;J. Vac. Sci. Technol. B,2007
4. Effect of EUV exposure upon surface residual chemicals on EUV mask surface;Lee;Proc. SPIE,2010
5. Lifetime of EUVL masks as a function of degree of carbon contamination and capping materials;Huh;Proc. SPIE,2008