Leveraging sub-E0 dose assessment methodology to improve EUV lithography cluster dose performance-Reference-Cited by-同舟云学术

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Leveraging sub-E0 dose assessment methodology to improve EUV lithography cluster dose performance

Published:2020-03-23 Issue: Volume: Page:
ISSN:
Container-title:Extreme Ultraviolet (EUV) Lithography XI
language:
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Author:

Robinson Chris F.,Murray Cody J.,Meli Luciana,De Silva Anuja,Goldfarb Dario,Thomas Conor,Sunder Madhana,Zaitz Mary Ann,Lian Guoda,Yao Yiping,Tai Leo,Bunt Jay,Rosa Jim,Ali Malik,Boettcher Steven,Stalter Mark

Publisher

SPIE

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Imaging validation for LS of dark field low-n vs Ta-based absorber masks;International Conference on Extreme Ultraviolet Lithography 2023;2023-11-21

2. Evaluation of Lines and Spaces printing and general understanding of imaging with dark field low-n mask;Journal of Micro/Nanopatterning, Materials, and Metrology;2023-04-17

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