1. Particle detection on flat surfaces;Donck,2011
2. Optimized qualification protocol on particle cleanliness for EUV mask infrastructure;Donck,2011
3. Particle qualification procedure for the TNO EUV reticle load port module of the HamaTech MaskTrackPro cleaning tool;Stortelder,2011
4. Investigating the intrinsic cleanliness of automated handling designed for EUV mask pod-in-pod systems;Brux,2011
5. R. Jonkheere, D. van den Heuvel, B. Baudemprez, C. Jehoul and A. Pacco, “a year of new mask defectivity insights n IMEC’s EUVL program,” EUVL symposium 2013, Toyama (2013).