1. Rigorous electromagnetic field mask modeling and related lithographic effects in the low and ultrahigh numerical aperture regime
2. Topography effects and wave aberrations in advanced PSM-technology;Erdmann,2001
3. Impact of the EUV mask phase response on the asymmetry of Bossung curves as predicted by rigorous EUV mask simulations;Krautschik,2001
4. Litho and patterning challenges for memory and logic applications at the 22nm node;Finders,2010
5. Mutual source, mask and projector pupil optimization;Fühner,2012