Publisher
SPIE-Intl Soc Optical Eng
Subject
Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference36 articles.
1. Mask modeling in the low k 1 and ultrahigh NA regime: phase and polarization effects (Invited Paper)
2. A. Erdmann , “Modeling and simulation,” inHandbook of Photomask Manufacturing Technology, S. Rizvi , Ed., pp. 649–691, Taylor and Francis, New York (2005).
3. Taflove ,Computational Electrodynamics: The Finite-Difference Time-Domain Method, Artech House, Boston, MA (1995).
4. Mask topography effects in projection printing of phase-shifting masks
5. Lithography simulation employing rigorous solutions to Maxwell's equations
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35 articles.
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