1. A. Erdmann and W. Henke, Simulation of optical lithography in optics and optoelectronics - theory, devices and applications, Proc. SPIE, 3729, 480 (1999).
2. C.A. Mack, in:J.R. Sheats and B.W. Smith (eds.), Optical Lithography Modeling, Microlithography, Science and Technology, Marcel Dekker, New York, 1998.
3. P;Neureuther A.R.,1997