Publisher
SPIE-Intl Soc Optical Eng
Subject
Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference30 articles.
1. International Technology Roadmap for Semiconductors, http://public.itrs.net.
2. P. Y. Yan , “Masks for extreme ultraviolet lithography,” Chap. 11 inHandbook of Photomask Manufacturing Technology, S. Rizvi , Ed., CRC press, San Jose, CA (2005).
3. Mo/Si multilayers with enhanced TiO 2 - and RuO 2 -capping layers
4. EUV mask process development and integration
5. V. Bakshi , “EUV sources for lithography,” Chap. 8 inZ∗Code for DPP and LPP Source Modeling, pp. 224–269, SPIE Optical Engineering Press, Bellingham, WA (2006).
Cited by
2 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献