Author:
Kamikubo Takashi,Ohnishi Takayuki,Hara Shigehiro,Anze Hirohito,Hattori Yoshiaki,Tamamushi Shuichi,Bai Shufeng,Wang Jen-Shiang,Howell Rafael,Chen George,Li Jiangwei,Tao Jun,Wiley Jim,Kurosawa Terunobu,Saito Yasuko,Takigawa Tadahiro
Cited by
17 articles.
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1. Preliminary study of photomask pattern inspection by beam-shaped knife-edge interferometry;Precision Engineering;2022-09
2. Low-voltage electron scattering in advanced extreme ultraviolet masks;Japanese Journal of Applied Physics;2022-08-01
3. Multi-beam mask writer MBM-1000;Novel Patterning Technologies for Semiconductors, MEMS/NEMS, and MOEMS 2019;2019-03-26
4. A first review of optical edge-diffraction technology for precision dimensional metrology;The International Journal of Advanced Manufacturing Technology;2019-02-01
5. Multibeam mask writer MBM-1000;Journal of Micro/Nanolithography, MEMS, and MOEMS;2018-09-24