Preliminary study of photomask pattern inspection by beam-shaped knife-edge interferometry

Author:

Wang ZhikunORCID,Lin PengfeiORCID,Lee ChaBumORCID

Funder

Division of Civil, Mechanical and Manufacturing Innovation

NSF

National Science Foundation

Oak Ridge National Laboratory

Publisher

Elsevier BV

Subject

General Engineering

Reference21 articles.

1. Advanced mask inspection and metrology;Yoshioka;AIP Conf Proc,2003

2. Projection optical lithography;Rothschild;Mater Today,2005

3. Super-resolution optical measurement of nanoscale photoacid distribution in lithographic materials;Adam;ACS Nano,2012

4. Mask Process Correction (MPC) modeling and its application to EUV mask for Electron beam mask writer, EBM-7000;Kamikubo;Proc SPIE,2010

5. IMS chips photo mask technology, overview and classification;Sailer,2010

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