Modeling high-efficiency extreme ultraviolet etched multilayer phase-shift masks-Reference-Cited by-同舟云学术

Modeling high-efficiency extreme ultraviolet etched multilayer phase-shift masks

Published:2017-12-09 Issue:04 Volume:16 Page:1
ISSN:1932-5150
Container-title:Journal of Micro/Nanolithography, MEMS, and MOEMS
language:
Short-container-title:J. Micro/Nanolith. MEMS MOEMS

Author:

Sherwin Stuart¹,Neureuther Andrew¹,Naulleau Patrick²

Affiliation:

1. University of California Berkeley, Department of Electrical Engineering and Computer Science, Berkel

2. Lawrence Berkeley National Laboratory, Center for X-Ray Optics, Berkeley, California

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

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