3D mask effects in high NA EUV imaging-Reference-Cited by-同舟云学术

3D mask effects in high NA EUV imaging

Published:2019-03-26 Issue: Volume: Page:
ISSN:
Container-title:Extreme Ultraviolet (EUV) Lithography X
language:
Short-container-title:

Author:

Erdmann Andreas,Evanschitzky Peter,Bottiglieri Gerardo,van Setten Eelco,Fliervoet Timon

Publisher

SPIE

Reference24 articles.

1. High-numerical aperture extreme ultraviolet scanner for 8-nm lithography and beyond;van Schoot;Journal of Micro/Nanolithography, MEMS, and MOEMS,2017

2. Imaging performance of EUV lithography optics configuration for sub-9nm resolution;Neumann,2015

3. High-NA EUV lithography: The next step in EUV imaging;van Setten,2019

4. Edge placement error control and mask3D effects in high-NA anamorphic EUV lithography;van Setten,2017

5. Challenges of anamorphic high-NA lithography and mask making;Hsu;Adv. Opt. Techn.,2017

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3. Fast diffraction model of an EUV mask based on asymmetric patch data fitting;Applied Optics;2023-08-21

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