High-NA mask phase-effects studied by AIMS EUV-Reference-Cited by-同舟云学术

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High-NA mask phase-effects studied by AIMS EUV

Published:2024-04-10 Issue: Volume:PC12325 Page:87
ISSN:
Container-title:Optical and EUV Nanolithography XXXVII
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Author:

Roesch Matthias,Kersteen Grizelda,Verch Andreas,Albert Maximilian,Heringlake Philip,Gwosch Klaus,Capelli Renzo

Publisher

SPIE

Reference8 articles.

1. High-NA EUVL exposure tool: program progress and mask interaction;Jan van,2022

2. 3D mask effects in high NA EUV imaging;Andreas,2019

3. AIMSTM EUV first insertion into the back end of the line of a mask shop: a crucial step enabling EUV production;Renzo,2019

4. AIMS EUV evolution towards high NA: challenge definition and solutions implementation;Renzo,2022

5. Rigorous diffraction analysis for future mask technology;Andreas,2000

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