Modeling and measurement of hydrogen radical densities of in situ plasma-based Sn cleaning source-Reference-Cited by-同舟云学术

Modeling and measurement of hydrogen radical densities of in situ plasma-based Sn cleaning source

Published:2017-04-07 Issue:2 Volume:16 Page:023501
ISSN:1932-5150
Container-title:Journal of Micro/Nanolithography, MEMS, and MOEMS
language:en
Short-container-title:J. Micro/Nanolith. MEMS MOEMS

Author:

Elg Daniel T.¹,Panici Gianluca A.¹,Peck Jason A.¹,Srivastava Shailendra N.²,Ruzic David N.¹

Affiliation:

1. University of Illinois at Urbana-Champaign, Center for Plasma-Material Interactions, Department of Nuclear, Plasma, and Radiological Engineering, Urbana, Illinois, United States

2. University of Illinois at Urbana-Champaign, Applied Research Institute, Champaign, Illinois, United States

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference34 articles.

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