Design technology co-optimization assessment for directed self-assembly-based lithography: design for directed self-assembly or directed self-assembly for design?
Author:
Affiliation:
1. IBM Corporation, IBM Research Division, Yorktown Heights, New York, United States
2. GlobalFoundries Inc., Hopewell Junction, New York, United States
3. Samsung Electronics Corp., Hopewell Junction, New York, United States
Publisher
SPIE-Intl Soc Optical Eng
Subject
Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
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