Design technology co-optimization assessment for directed self-assembly-based lithography: design for directed self-assembly or directed self-assembly for design?-Reference-Cited by-同舟云学术

Design technology co-optimization assessment for directed self-assembly-based lithography: design for directed self-assembly or directed self-assembly for design?

Published:2017-02-07 Issue:1 Volume:16 Page:013502
ISSN:1932-5150
Container-title:Journal of Micro/Nanolithography, MEMS, and MOEMS
language:en
Short-container-title:J. Micro/Nanolith. MEMS MOEMS

Author:

Lai Kafai¹,Liu Chi-Chun¹,Tsai Hsinyu¹,Xu Yongan¹,Chi Cheng¹,Raghunathan Ananthan²,Dhagat Parul²,Hu Lin²,Park Oseo²,Jung Sunggon³,Cho Wooyong³,Morillo Jaime¹,Pitera Jed¹,Schmidt Kristin¹,Guillorn Mike¹,Brink Markus¹,Sanders Daniel¹,Felix Nelson¹,Bailey Todd²,Colburn Matthew¹

Affiliation:

1. IBM Corporation, IBM Research Division, Yorktown Heights, New York, United States

2. GlobalFoundries Inc., Hopewell Junction, New York, United States

3. Samsung Electronics Corp., Hopewell Junction, New York, United States

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

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