Enhanced and Efficient Guiding Template Design for Lamellar DSA With Graph Monomorphism
Author:
Affiliation:
1. Department of Electrical Engineering, National Taiwan University of Science and Technology, Taipei, Taiwan
2. Department of Computer Science and Information Engineering, National Taiwan University of Science and Technology, Taipei, Taiwan
Funder
Taiwan Semiconductor Manufacturing Company
Siemens EDA
MOST of Taiwan
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Subject
Electrical and Electronic Engineering,Computer Graphics and Computer-Aided Design,Software
Link
http://xplorestaging.ieee.org/ielx7/43/10288105/10106483.pdf?arnumber=10106483
Reference20 articles.
1. Design technology co-optimization assessment for directed self-assembly-based lithography: design for directed self-assembly or directed self-assembly for design?
2. DSA-friendly detailed routing considering double patterning and DSA template assignments;yu;Proc DAC,2018
3. Guiding template design for lamellar DSA with multiple patterning and self-aligned via process
4. Design technology co-optimization (DTCO) study on self-aligned-via (SAV) with lamella DSA for sub-7 nm technology;ma;Proc SPIE,2017
5. ISPD 2015 Benchmarks with Fence Regions and Routing Blockages for Detailed-Routing-Driven Placement
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