Dry-Etching Processes for High-Aspect-Ratio Features with Sub-10 nm Resolution High-χ Block Copolymers-Reference-Cited by-同舟云学术

Dry-Etching Processes for High-Aspect-Ratio Features with Sub-10 nm Resolution High-χ Block Copolymers

Published:2021-10-12 Issue:41 Volume:13 Page:49184-49193
ISSN:1944-8244
Container-title:ACS Applied Materials & Interfaces
language:en
Short-container-title:ACS Appl. Mater. Interfaces

Author:

Pound-Lana Gwenaelle¹^ORCID,Bézard Philippe¹,Petit-Etienne Camille¹,Cavalaglio Sébastien¹,Cunge Gilles¹,Cabannes-Boué Benjamin²,Fleury Guillaume²,Chevalier Xavier³^ORCID,Zelsmann Marc¹^ORCID

Affiliation:

1. Univ. Grenoble Alpes, CNRS, CEA/LETI Minatec, Grenoble INP, LTM, 38000 Grenoble, France

2. Univ. Bordeaux, CNRS, Bordeaux INP, LCPO, UMR 5629, F-33600 Pessac, France

3. ARKEMA FRANCE, GRL, Route Nationale 117, BP34, 64170 Lacq, France

Funder

Agence Nationale de la Recherche

Minist??re de l'Education Nationale, de l'Enseignement Superieur et de la Recherche

R??gion Rh??ne Alpes

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acsami.1c13503

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