Computational aspects of optical lithography extension by directed self-assembly-Reference-Cited by-同舟云学术

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Computational aspects of optical lithography extension by directed self-assembly

Published:2013-04-12 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
language:
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Author:

Lai Kafai,Liu Chi-chun,Pitera Jed,Dechene Daniel J.,Schepis Anthony,Abdallah Jassem,Tsai Hsinyu,Guillorn Mike,Cheng Joy,Doerk Gregory,Tjio Melia,Rettner Charles,Odesanya Olalekan,Ozlem Melih,Lafferty Neal

Publisher

SPIE

Cited by 13 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Design of Microstructure Parameters on a Small Multi-Throttle Aerostatic Guideway in Photolithography;Engineering;2021-02

2. Model-based guiding pattern synthesis for robust assembly of contact layers using directed self-assembly;Journal of Micro/Nanolithography, MEMS, and MOEMS;2018-03-23

3. Design technology co-optimization assessment for directed self-assembly-based lithography: design for directed self-assembly or directed self-assembly for design?;Journal of Micro/Nanolithography, MEMS, and MOEMS;2017-02-07

4. Resolution Enhancement Techniques and Mask Data Preparation;Electronic Design Automation for IC Implementation, Circuit Design, and Process Technology;2016-04-14

5. A General Design Strategy for Block Copolymer Directed Self-Assembly Patterning of Integrated Circuits Contact Holes using an Alphabet Approach;Nano Letters;2015-01-08

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