Grouping design method with real ray tracing model for extreme ultraviolet lithographic objective-Reference-Cited by-同舟云学术

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Grouping design method with real ray tracing model for extreme ultraviolet lithographic objective

Published:2013-12-16 Issue:12 Volume:52 Page:125102
ISSN:0091-3286
Container-title:Optical Engineering
language:en
Short-container-title:Opt. Eng

Author:

Cao Zhen,Li Yanqiu,Liu Fei

Publisher

SPIE-Intl Soc Optical Eng

Subject

General Engineering,Atomic and Molecular Physics, and Optics

Cited by 13 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Aberration budget analysis of EUV lithography from the imaging performance of a contact layer in a 5 nm technology node;Applied Optics;2023-09-15

2. 高数值孔径宽谱段折反射式物镜设计;Acta Optica Sinica;2023

3. 极紫外光刻机曝光系统光学设计研究与进展;Acta Optica Sinica;2023

4. Design of an extreme ultraviolet lithography projection objective with a grouping design method through forward and reverse real ray tracing;Applied Optics;2022-08-25

5. Optimizing the aberration distribution to improve the lithography performance of Contact layer in 5nm node;2021 International Workshop on Advanced Patterning Solutions (IWAPS);2021-12-12

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