Affiliation:
1. Institute of Microelectronics of Chinese Academy of Sciences
2. University of Chinese Academy of Sciences
3. Guangdong Greater Bay Area Applied Research Institute of Integrated Circuit and Systems
Abstract
By analyzing the impact of aberration in an extreme ultraviolet
lithography projector on the imaging indicators of the test patterns
for a contact layer in a 5 nm technology node, this paper
establishes a mathematical aberration model based on the back
propagating neutral network. On the basis of an aberration model, a
method for estimating the aberration budget is proposed, which can
help reduce the difficulty of achieving imaging performance thresholds
in actual production. The performance of the results given by this
method is verified by using a rigorous simulation. The results show
that the model is highly accurate in predicting an aberration
distribution that meets the requirements through an inverse
sensitivity analysis and can calculate the wavefront aberration margin
based on imaging indicators.
Funder
Guangdong Province Research and
Development Program in Key Fields
Ministry of Science and Technology of the
People’s Republic of China
National Natural Science Foundation of
China
University of Chinese Academy of
Sciences
Fundamental Research Funds for the
Central Universities
Youth Innovation Promotion Association of
the Chinese Academy of Sciences
Beijing Institute of
Electronics
Beijing Association for Science and
Technology
Subject
Atomic and Molecular Physics, and Optics,Engineering (miscellaneous),Electrical and Electronic Engineering
Cited by
2 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献