1. International Technology Roadmap for Semiconductors (ITRS) 2015 Edition (2015)
2. Bohr M (2017) Moore’s law leadership. Intel Technology and Manufacturing Day, Beijing
3. Neisser M, Wurm S (2013) Overview of next generation lithography, advanced patterning, EUV and self assembly. In: Proceedings of the international conference on frontiers of characterization and metrology, Gaithersburg, Maryland, 2013
4. Mulkens J, Hanna M, Wei H et al (2015) Overlay and edge placement control strategies for the 7-nm node using EUV and ArF lithography. Proc SPIE 9422:94221Q
5. Pan DZ, Liebmann L, Yu B, Xu X, Lin Y (2015) Pushing multiple patterning in sub-10 nm: are we ready?, In: Proceedings of the 52nd annual design automation conference, pp 1–6