Feasibility of monitoring a multiple e-beam tool using scatterometry and machine learning: stitching error detection-Reference-Cited by-同舟云学术

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Feasibility of monitoring a multiple e-beam tool using scatterometry and machine learning: stitching error detection

Published:2018-09-19 Issue: Volume: Page:
ISSN:
Container-title:34th European Mask and Lithography Conference
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Author:

Rademaker Guido,Blancquaert Yoann,Mourier Lucie,Labbaye Thibault,Figueiro Nivea,Sanchez Francisco,Koret Roy,Pradelles Jonathan,Landis Stefan,Rey Stéphane,Haupt Ronny,Bringoltz Barak,Shifrin Michael,Kandel Daniel,Ger Avron,Sendelbach Matthew,Wolfling Shay,Pain Laurent

Publisher

SPIE

Reference7 articles.

1. Performance validation of Mapper’s FLX-1200;Wieland,2018

2. Process development of a maskless N40 via level for security application with multi-beam lithography

3. Scanning exposures with a MAPPER multibeam system

4. Demonstration of real-time pattern correction for high-throughput maskless lithography

5. Scatterometry control for multiple electron beam lithography

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