Process development of a maskless N40 via level for security application with multi-beam lithography

Author:

Servin Isabelle,Pimenta-Barros Patricia,Pradelles Jonathan,Blancquaert Yoann,Essomba Philippe,Landis Stéfan,ten Berge Gerard F.,Wieland Marco,Bernadac Arthur,Germain Allan,Brun Philippe

Publisher

SPIE

Cited by 3 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Current State and Prospects for the Development of X-Ray Lithography;Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques;2023-02

2. Digital scanner, optical maskless exposure tool with DUV solid state laser;Optical Microlithography XXXIV;2021-02-22

3. Feasibility of monitoring a multiple e-beam tool using scatterometry and machine learning: stitching error detection;34th European Mask and Lithography Conference;2018-09-19

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