Digital scanner, optical maskless exposure tool with DUV solid state laser-Reference-Cited by-同舟云学术

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Digital scanner, optical maskless exposure tool with DUV solid state laser

Published:2021-02-22 Issue: Volume: Page:
ISSN:
Container-title:Optical Microlithography XXXIV
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Author:

Watanabe Yoji,Kono Hirotaka,Kanaya Yuho,Saito Yusuke,Sakamoto Toshiaki,Owa Soichi,Hirayanagi Noriyuki,Koo Thomas,Poppe Craig,Tseng David,Sorensen Conrad,Lee Hwan,Renwick Stephen,Yuan Bausan

Publisher

SPIE

Cited by 8 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Imaging study of phase shift spatial light modulator for digital scanner;Optical and EUV Nanolithography XXXVII;2024-04-10

2. Past progress, current status, and future perspective of digital EUV lithography for high-resolution semiconductor manufacturing;Novel Patterning Technologies 2024;2024-04-09

3. Review of optical direct-write technology for semiconductor manufacturing;Journal of Micro/Nanopatterning, Materials, and Metrology;2023-06-05

4. Development of deep ultraviolet optical maskless exposure tool for advanced lithography;Journal of Micro/Nanopatterning, Materials, and Metrology;2023-06-05

5. Maskless lithography for large area patterning of three-dimensional microstructures with application on a light guiding plate;Optics Express;2023-03-28

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