Demonstration of real-time pattern correction for high-throughput maskless lithography-Reference-Cited by-同舟云学术

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Demonstration of real-time pattern correction for high-throughput maskless lithography

Published:2011-03-17 Issue: Volume: Page:
ISSN:0277-786X
Container-title:Alternative Lithographic Technologies III
language:
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Author:

Hakkennes E. A.,Wiersma A. D.,Hoving M.,Venema N.,Woutersen S.,van de Peut T.,Sanderse M.,Wieland M. J.

Publisher

SPIE

Cited by 8 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Feasibility of monitoring a multiple e-beam tool using scatterometry and machine learning: stitching error detection;34th European Mask and Lithography Conference;2018-09-19

2. Development of massively parallel electron beam direct write lithography using active-matrix nanocrystalline-silicon electron emitter arrays;Microsystems & Nanoengineering;2015-11-09

3. Alternative stitching method for massively parallel e-beam lithography;Journal of Micro/Nanolithography, MEMS, and MOEMS;2015-07-02

4. Stitch-Aware Routing for Multiple E-Beam Lithography;IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems;2015-03

5. Review of Development and Performance Evaluation of Active-matrix Nanocrystalline Si Electron Emitter Array for Massively Parallel Electron Beam Direct-write Lithography;IEEJ Transactions on Sensors and Micromachines;2015

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