Scatterometry control for multiple electron beam lithography
Author:
Affiliation:
1. CEA-LETI (France)
2. Nova Measuring Instruments GmbH (Germany)
3. Nova Measuring Instruments Ltd. (Israel)
4. Nova Measuring Instruments Inc. (United States)
Publisher
SPIE
Reference8 articles.
1. Demonstration of EDA flow for massively parallel e-beam lithography
2. Scatterometry-based Defect Detection for DSA In-line Process Control;Robin,2015
3. MAPPER: progress toward a high-volume manufacturing system
4. Performance validation of Mapper's FLX-1200;Wieland,2015
5. Impact of shrinking measurement error budgets on qualification metrology sampling and cost
Cited by 2 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Feasibility of monitoring a multiple e-beam tool using scatterometry and machine learning: stitching error detection;34th European Mask and Lithography Conference;2018-09-19
2. Performance validation of Mapper FLX-1200;34th European Mask and Lithography Conference;2018-09-19
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