Novel aberration monitor for optical lithography
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SPIE
Cited by 42 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Computational distortion prediction method considering characteristics of EUV lithography;Optical and EUV Nanolithography XXXVII;2024-04-10
2. Rapid image-based pupil plane characterization for EUV lithography systems;International Conference on Extreme Ultraviolet Lithography 2018;2018-10-09
3. Impact of aberrations in EUV lithography: metal to via edge placement control;Extreme Ultraviolet (EUV) Lithography IX;2018-03-19
4. In situaberration measurement method using a phase-shift ring mask;Journal of Micro/Nanolithography, MEMS, and MOEMS;2014-11-13
5. Optimization of image-based aberration metrology for EUV lithography;SPIE Proceedings;2014-04-17
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