1. Microlithography
2. Kempsell Sears, M., Bekaert, J. and Smith, B. W., “Pupil wavefront manipulation for optical nanolithography,” presented at SPIE, 2012, 832611–832611–11.
3. Quantifying EUV imaging tolerances for the 70-, 50-, 35-nm modes through rigorous aerial image simulations;Krautschik,2001
4. Thermomechanical modeling of the EUV reticle during exposure;Martin,2001
5. Description des procedees employes pour reconnaitre la configuration des surfaces optiques;Foucault;C. R. Acad. Sci.,1858