Imaging enhancement by reduction of mask topography induced phase aberrations for horizontal 1D spaces under D90Y illumination-Reference-Cited by-同舟云学术

Imaging enhancement by reduction of mask topography induced phase aberrations for horizontal 1D spaces under D90Y illumination

Published:2015-10-23 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Last T.,de Winter L.,Finders J.

Publisher

SPIE

Reference6 articles.

1. J. Finders, L. de Winter, T. Last “Impact of Mask 3D induced Phase on aerial image position and the mitigation by absorber optimization for ArFi and EUV lithography”, submitted to JM3.

2. Understanding the Litho-impact of phase due to 3D mask-effects when using off-axis illumination;de Winter,2015

3. Mask-induced best focus shifts in DUV and EUV lithography;Erdmann,2015

4. Experimental approach to EUV imaging enhancement by mask absorber height optimization;Davydova,2013

5. Simplified model for absorber feature transmissions on EUV masks;Lam,2006

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