Impact of EUV SRAF on Bossung tilt
Author:
Affiliation:
1. Univ. of California, Berkeley (United States)
2. ASML Brion (United States)
3. Lawrence Berkeley National Lab. (United States)
Publisher
SPIE
Reference9 articles.
1. Mitigation of mask three-dimensional induced phase effects by absorber optimization in ArFiand extreme ultraviolet lithography
2. Mask-induced best-focus-shifts in DUV and EUV lithography;Erdmann,2015
3. Polarization-induced astigmatism caused by topographic masks;Rouff,2007
4. Best focus shift mechanism for thick masks;Burkhardt,2015
5. Understanding the Litho-impact of phase due to 3D mask-effects when using off-axis illumination;Winter,2015
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1. Through-focus EUV multilayer defect compensation considering optical proximity correction;Applied Optics;2022-05-16
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