Simulating semiconductor structures for next-generation optical inspection technologies
Author:
Affiliation:
1. Applied Materials Israel, Oppenheimer Street 9, Rehovot 76701, Israel
2. Lumerical Solutions, Inc., 535 Thurlow Street, Vancouver BC V6E 3L2, Canada
Publisher
SPIE-Intl Soc Optical Eng
Subject
General Engineering,Atomic and Molecular Physics, and Optics
Reference13 articles.
1. Defect metrology challenges at the 11-nm node and beyond
2. The limits and extensibility of optical patterned defect inspection
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4. Optical illumination optimization for patterned defect inspection
5. Advanced lithography: wafer defect scattering analysis at DUV
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