1. Optimizing CD-SEM metrology for anamorphic high-NA EUV photomasks;Photomask Technology 2023;2023-11-21
2. Enhancing 6 nm CD Patterned Defect Classification with TSOM and CNNs;2023 34th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC);2023-05-01
3. 先进节点图案化晶圆缺陷检测技术;Laser & Optoelectronics Progress;2023
4. Optical wafer defect inspection at the 10 nm technology node and beyond;International Journal of Extreme Manufacturing;2022-04-21
5. Surface Contaminants and Surface Cleanliness Levels;Surfactants in Precision Cleaning;2022