High-sensitivity molecular organometallic resist for EUV (MORE)-Reference-Cited by-同舟云学术

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High-sensitivity molecular organometallic resist for EUV (MORE)

Published:2015-03-20 Issue: Volume: Page:
ISSN:0277-786X
Container-title:Advances in Patterning Materials and Processes XXXII
language:
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Author:

Passarelli James,Murphy Michael,Del Re Ryan,Sortland Miriam,Dousharm Levi,Vockenhuber Michaela,Ekinci Yasin,Neisser Mark,Freedman Daniel A.,Brainard Robert L.

Publisher

SPIE

Reference12 articles.

1. G. Moore, Electronics, 1965, 38.

2. J. Paul, M. Rudolph, S. Riedel, S. Wege, C. Hohle and V. Beyer, The Electrochemical Society Abstract 2012.

3. Advanced Etch Technology for Nanopatterning II;Paul,2013

4. Characterization of the Photoacid Diffusion Length and Reaction Kinetics in EUV Photoresists with IR Spectroscopy

5. Effects of photoresist polymer molecular weight on line-edge roughness and its metrology probed with Monte Carlo simulations

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