XUV Absorption Spectroscopy and Photoconversion of a Tin-Oxo Cage Photoresist-Reference-Cited by-同舟云学术

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XUV Absorption Spectroscopy and Photoconversion of a Tin-Oxo Cage Photoresist

Published:2024-02-27 Issue:9 Volume:128 Page:3965-3974
ISSN:1932-7447
Container-title:The Journal of Physical Chemistry C
language:en
Short-container-title:J. Phys. Chem. C

Author:

Sadegh Najmeh¹,Evrard Quentin¹^ORCID,Kraus Peter M.¹²^ORCID,Brouwer Albert M.¹³^ORCID

Affiliation:

1. Advanced Research Center for Nanolithography, Science Park 106, 1098 XG Amsterdam, The Netherlands

2. Department of Physics and Astronomy, and LaserLaB, Vrije Universiteit, De Boelelaan 1105, 1081 HV Amsterdam, The Netherlands

3. van ‘t Hoff Institute for Molecular Sciences, University of Amsterdam, Science Park 904, 1098 XH Amsterdam, The Netherlands

Funder

H2020 Marie Sklodowska-Curie Actions

Publisher

American Chemical Society (ACS)

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.jpcc.3c07480

Reference65 articles.

1. EUV Lithography Technology for High-volume Production of Semiconductor Devices

2. High-NA EUV lithography: current status and outlook for the future

3. Lithographic Imaging Techniques for the Formation of Nanoscopic Features

4. Advances in Patterning Materials for 193 nm Immersion Lithography

5. Chemical amplification resists: Inception, implementation in device manufacture, and new developments

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Balancing sensitivity and resolution by feedback regulation of free radicals from Sn-C bonds in tin-oxygen clusters EBL photoresist;Science China Materials;2024-08-22

2. Extreme Ultraviolet Photoresponse of Organotin-Based Photoresists with Borate Counteranions;ACS Applied Materials & Interfaces;2024-08-05

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