Actinic review of EUV masks: first results from the AIMS EUV system integration
Author:
Affiliation:
1. Carl Zeiss SMT GmbH (Germany)
2. Carl Zeiss SMS GmbH (Germany)
3. SEMATECH Inc. (United States)
Publisher
SPIE
Reference8 articles.
1. A. Garetto et al., Proc. of SPIE 7488, 7844–15 (2009).
2. EUV Defect Repair Strategy;Peters,2011
3. Repair of natural EUV reticle defects;Jonckheere,2011
4. The EUV Mask Metrology Gap;Rice,2009
5. Actinic Review of EUV Masks;Feldmann,2010
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2. Development of an EUV Microscope with Focused Coherent EUV Based on Coherent Diffraction Imaging Method for Defect Evaluation on an EUV Mask;Electronics and Communications in Japan;2018-01-19
3. Actinic review of EUV masks: challenges and achievements in delivering the perfect mask for EUV production;Photomask Technology;2017-10-16
4. Actinic review of EUV masks: performance data and status of the AIMS EUV system;SPIE Proceedings;2017-03-24
5. Development of an EUV Microscope with Focused Coherent EUV based on Coherent Diffraction Imaging Method for Defect Evaluation on an EUV Mask;IEEJ Transactions on Fundamentals and Materials;2017
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