Actinic review of EUV masks: challenges and achievements in delivering the perfect mask for EUV production-Reference-Cited by-同舟云学术

Actinic review of EUV masks: challenges and achievements in delivering the perfect mask for EUV production

Published:2017-10-16 Issue: Volume: Page:
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Container-title:Photomask Technology
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Author:

Capelli Renzo,Dietzel Martin,Hellweg Dirk,Wolke Conrad,Kersteen Grizelda,Koch Markus,Gehrke Ralf

Publisher

SPIE

Reference15 articles.

1. Enabling sub-10nm node lithography: presenting the NXE:3400B EUV scanner;van de Kerkhof,2017

2. “ 2017 eBeam Initiative Mask Maker Survey Results”, http://www.ebeam.org/docs/ebeam_survey_mask_2017.pdf?v=2 (09/2017)

3. Printability and actinic AIMS review of programmed mask blank defects;Verduijn,2017

4. N7 dark field two-bar in 0.33NA EUVL: Mitigation of CD Bossung tilts caused by strong coupling between the feature’s primary and 1st self-image;Last,2017

5. Reducing EUV mask 3D effects by alternative metal absorbers;Philipsen,2017

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1. 极紫外光刻掩模缺陷检测与补偿技术研究;Laser & Optoelectronics Progress;2022

2. Non-axisymmetric droplet irradiation effects on ion and extreme ultraviolet light emission of laser-produced plasma light sources;Journal of Applied Physics;2021-06-21

3. AIMS™ EUV tool platform: aerial-image based qualification of EUV masks (Conference Presentation);Photomask Technology 2018;2018-10-23

4. Aerial image based metrology of EUV masks: recent achievements, status, and outlook for the AIMS EUV platform;Extreme Ultraviolet (EUV) Lithography IX;2018-03-19